Step-and-Repeat Lithography Machine
Precision lithography equipment for repeatedly exposing high-resolution patterns on substrates, ideal for semiconductor, MEMS, and photonics manufacturing.
Key Features:
✔️Step-and-repeat exposure enables consistent replication of micro- and nano-scale patterns
✔️High-precision alignment ensures accurate overlay across multiple exposures
✔️Modular mask and substrate stages support versatile patterning applications
✔️motion control maintains uniform exposure across all fields
✔️Compatible with multiple lithography techniques, including UV and nanoimprint
✔️Automated substrate handling and repeat sequencing increase operational throughput
✔️Software-controlled exposure allows custom pattern sequencing and monitoring
✔️Designed for research, prototyping, and high-precision industrial production
Step-and-Repeat Lithography Machine
The Step-and-Repeat Lithography Machine (LSLM-500) is designed for high-resolution pattern transfer in semiconductor manufacturing. Its compact frame measures approximately 2.2 meters in length and 1.5 meters in width, with a height of 1.8 meters, and weighs around 1,200 kilograms. The machine incorporates a motorized X-Y stage capable of micron-level positioning, a vacuum substrate holder, and a high-stability optical projection system. The primary structure is constructed from reinforced aluminum alloy with vibration-damping mounts, ensuring minimal mechanical drift during operation. The exposure system employs a mercury arc lamp coupled with precision lenses to reduce the mask image onto the wafer surface accurately.
The machine features a multi-layer reticle alignment system, allowing precise registration of multiple patterns. Its control unit integrates a digital interface with stepper motors, enabling programmable step-and-repeat cycles across wafers of 2 to 6 inches. The substrate platform includes adjustable clamps compatible with both silicon and gallium arsenide wafers. Its high-transmission optics maintain consistent illumination across the exposure field, and the device operates within a cleanroom environment to prevent contamination. The LSLM-500 also includes automated cooling channels and an emergency stop system for safe operation.
In real-world scenarios, the Step-and-Repeat Lithography Machine is widely used in research labs and semiconductor fabrication units for producing small- and medium-scale integrated circuits. It supports the manufacturing of surface acoustic wave devices, memory chips, microcontrollers, and custom silicon-based prototypes. Military, aerospace, and civilian electronics projects rely on its ability to replicate complex patterns across multiple wafers with high alignment accuracy.
Engineers and researchers can trust Tactical Supply Pakistan to deliver reliable and industrial-grade equipment. The company provides full technical support and ensures that the LSLM-500 meets international operational standards.
What is the minimum feature size this machine can transfer onto a substrate?
The LSLM-500 can transfer features as small as 1.2 micrometers with consistent alignment across the wafer.
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